MS System for UHV Thermal Desorption Studies

Hiden’s TPD Workstation provides a versatile platform for precisely controlled thermal desorption studies (TDS) in the UHV pressure regime through a temperature range from 50 C to 1000 C.

Common applications include desorption studies of silicon wafers and thin-film coatings, quantification of hydrogen evolution from metals. The sample stage, with temperature ramp fully programmable at rates to 40 C per min, is shrouded by a heat shield incorporating water-cooling to minimize outgassing and between-sample cool down rate. Fast sample loading and extraction is enabled via the UHV load lock and sample transfer mechanism, maintaining optimum primary vacuum quality. Samples, typically in wafer form, are positively located on the sample stage to ensure efficient thermal contact with the heater surface. The quadrupole mass spectrometer, also with water-cooled jacket, is mounted with the acceptance aperture close to the sample surface for optimum capture of evolved gases. Sample temperature is merged directly with the soft control and acquisition program for combined presentation of multiple evolved species with temperature.